Ion™ 1500 DC Magnetron Power Supplies
The most advanced DC magnetron sputtering power supply in the world.
The most advanced DC magnetron sputtering power supply in the world.
RF power generators, automatic and manual impedance matching networks.
RF/DC switches allow multiple sputtering sources to be run sequentially from a single power supply.
DC Pass/RF Blocking Filters protect DC magnetron power supplies from RF induced damage.
Complete RF Power Generation System with Automatic Impedance Matching Network, Matching Network Controller-Power Supply and all Necessary Interconnect Cables

A 13.56 MHz power generator packaged in a 19" 1/2 rack configuration and a separate impedance matching network are provided. This allows the matching network to be located as close to the sputtering source or plasma load as possible. This is highly desirable and minimizes many problems like high reflected power, power cable overheating and burn-throughs and other unsafe conditions. Short cables are good. The impedance matching network provides the user with a broad tuning range. The impedance matching network is configured to enable it to match a wide range of impedances. The RF generator allows precise control from the front panel or via a rear panel analog or optional RS-232 interface. Power and tuning (capacitor) adjustment are accomplished either through knobs on the manual tuning network (forward and reflected power are read on the power generator front panel) or adjusted and read on the automatic matching network controller front panel or on the users sytem controls through the analog or optional RS-232 interface.
A set-point potentiometer allows the operator to set and vary Forward/Incident RF Power. Digital meters display Forward and Reflected/Reflectant Power developed on the source. The external control interface on the back of the unit allows the power generator to be controlled by the user's programmable controller or computer. LED indicators provide visual indications of the status of safety and functional interlocks. The power generation system incorporates high efficiency switch mode power supplies and solid-state technology. They are very robust and can accept 30% reflected power before they operate in fold-back mode.
300 watt and 600 watt 13.56 MHz packages - economically priced
Automatic and manual impedance matching networks available
19" 1/2 rack mount power generator, separate matching network
Complete - all necessary interconnect cables provided
Easy to read digital displays - user friendly controls
RS-232 and analog communication capability
Air cooled
CE, CSA and UL compliant
Low-cost switching modules allow one or two RF or DC power systems to be remotely switched between multiple sputtering sources for flexible R&D operation and reduced power-supply count. :contentReference[oaicite:4]{index=4}

These modules provide an easy way to remotely switch the output of one or two power systems between two sputtering sources per power supply. This provides a cost-effective approach in many R&D environments. They can replace the need for multiple separate power supplies at considerable cost savings. In the case of multiple sputtering sources using RF power, it is best that an individual impedance matching network be provided for each source, with the power switch located between the RF power generator and the impedance matching network. This ensures the individual load represented by each sputtering source can be optimized for different target materials and varied states of erosion. If the switch is located after the output of a single impedance matching network, it is likely that the network will have to be adjusted to compensate for significantly different loads (ie - metal target on one source and a dielectric target on the second source). High quality vacuum relays are used in the switches instead of open frame relays. Vacuum relays are preferred because they are more robust and provide reliable long-term operation.
The user must provide the necessary 24 VDC (< 1 amp) signals needed to operate the relays from a PLC or computer control system. An optional 1/2 rack remote controller is available. The controller comes with a 10' control cable.
Low cost method to sequentially run multiple sputtering sources using a single DC or RF power supply
2, 3 or 4 output models
2 power supply input models allow two power supplies to be connected to a single switch
Vacuum relays provide robust, reliable switching
Optional Remote Controller
Two Input Switch
One Power Supply Switched Between Up to 4 Outputs
One RF and One DC Power Supply (or two of each type) Connected to Switch Allows Two Outputs per Power Supply. Both Power Supplies Can be Run Simultaneously.
These filters protect DC power supplies and control systems from RF interference and damage when RF power is present in the sputtering environment. :contentReference[oaicite:9]{index=9}

Simply put, if you will run an RF power supply simultaneously with a DC magnetron power supply, you need one of these. This filter is required to be installed on the output of the Ion™ series power supplies when 13.56 MHz RF power is present in the sputtering environment ( including substrate bias and heaters in addition to RF power to one or more sputtering sources). Its use results in keeping the RF energy inside the “process” instead of leaking out and radiating. Radiation of RF energy may cause coupling to adjacent system cabling and interference with the connected hardware. The filter allows low-frequency (DC) < 1 MHz to pass from the DC power supply to the sputtering source while at the same time preventing RF power from interfering with or damaging DC or AC power supplies. The filter uses a “Pi” topology and ferrite cores. This is a somewhat more expensive, but much more reliable design compared to “L” topology without a ferrite core. Ferrite cores improve the stability, sensitivity and reliability of the filtering function. Plainly stated – the filter is more effective. Note that the orientation of the filter is important. The capacitor must always be on the power supply side (“output”) to ensure process stability. Input and output are defined as follows: Output: Toward Plasma Load Input: Toward DC or AC Power Supply
Protects DC Power Supplies and Control Systems from Damage & Interference
Filters RF from DC Components
Low Frequency DC (<1 MHz) Passes Through Without Interference
3 watts to 4 KW from 1 to 13.56 MHz
Connects at Output of DC Power Supply
CE, CSA & UL Compliant