SunSource™ sputtering sources provide measurable benefits like improved target utilization, argon gas injection through the cathode body, stable operation through out the useful target lifetime during pulsed reactive sputter deposition at 10-4 torr and much lower cost of ownership. The features and benefits described for our standard line of SunSource™ and SunSource GEN II sources are incorporated into the retrofit/upgrade designs we provide. Essentially, we take the basic sputtering module and configure it so that it fits within your existing system Usually (not always) we can do so.

The ability to implement these features into a source that fits within the physical constraints of an existing system is how we define a retrofit sputtering source. We are not interested in offering a source that performs and lasts just as poorly (but equally as well!) as the one it is replacing at a cheap price. If you consume one target every 5 years, you will probably run from the room clutching at your throat about how expensive the source is, especially if your purchased your used system on e-Bay for $5. Those interested in real productivity or trying to implement very difficult processes like an optical coating with less than 1% transmission adsorption will appreciate the performance of our upgrade retrofits and how reasonably they are priced for performance and reliability. Good value for money provides a fast payback and low cost of ownership. Maybe you just want to be able to "pour the coals" (aka shorten deposition time) to a source to shorten run times without overheating the source, target material or damaging the substrate or the system the source is installed in. Are you tired of constant leaks in the water lines, arcing and vastly different rates of target erosion top to bottom of a linear source or expensive repairs and spare parts? We can help.

Materials Science, Inc originally began offering & advertising "retrofit" sputtering sources in early 1994. Since then, this term has been adopted (co-opted?) by many of our competitors. At the time, major manufacturers like MRC, Sloan, Perkin-Elmer & Vac-Tec Systems had either completely exited the marketplace as sputtering system suppliers or were about to and were simply not-available to support their customer base with new and upgraded sputtering sources that solved real problems. Our main advantage at the time was greatly improved target utilization, but since then, we have continued to innovate and improve our SunSource™ sputtering sources. The guy with a "cheater bar" in his pocket to give extra leverage to a wrench to ensure all the fasteners are properly tightened and water lines don't leak is just as much in our mind as the scientist trying to figure out how many angels can dance on the head of a pin (has anyone finally figured this out?). SunSource™ sputtering sources have to satisfy both of them. Good design results from paying attention and being responsive.

SunSource GEN II™ Upgrade Replacement:

• Improved water flow through the cathode body, eliminating magnet overheating and reducing source instability that previously contributed to non-uniform film deposition.
• Enabled operation at significantly higher power levels, resulting in increased deposition rates and improved process capability.
• Achieved symmetrical, uniform power distribution across the target surface for more consistent sputtering performance.
• Improved gas distribution across the target surface, addressing argon depletion issues that previously caused significant coating non-uniformity.
• Reduced plasma disturbance caused by electron loss to nearby ground planes, helping maintain a more stable sputtering zone and more uniform film deposition.
• Enabled sputtering of targets thicker than 0.125", extending useful target life and reducing the frequency of maintenance driven by target replacement.
• Increased effective target utilization by approximately 25% by weight.