Precision sputtering technology

SunSource GEN II Linear Planar Magnetron Sputtering Sources

SunSource GEN II™ linear planar magnetron sputtering sources combine broad uniform erosion, active plasma discharge across nearly the entire target surface, KamLok™ fast target exchange, and argon gas through the cathode body to support high utilization, stable film performance, and lower maintenance across a wide range of process conditions.

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Source configurations

Internal and flange mount configurations for multiple installation requirements

Dual Feedthrough Internal Mount

Dual Feedthrough Internal Mount

Standard Flange Mount

Standard Flange Mount with Anode Shields & KamLok™

Exploded assembly view

Exploded Assembly View

Key features

Built for target utilization, higher rates, and low-maintenance operation


KamLok™ fast target exchange eliminates galling and seizure of fasteners and allows target changes in minutes, even while installed in the system.


Wide uniform erosion area supports stable operation with minimal distribution, uniformity, and rate changes through target life.


Broad active plasma discharge keeps the target clean and reduces insulating film growth that leads to arcing.


20% higher rates are supported by broad erosion area and highly efficient cooling.


Power levels can exceed 500 watts/in² for directly water cooled targets.


35–45 wt% real target utilization is defined using useful target life in practical applications, not artificial examples.


Argon gas through the cathode body removes the need for extra feedthroughs, external manifolds, and plasma-disturbing hardware.


Available in 90 mm, 5", and 6" target widths with internal and flange mount versions, including unbalanced magnet module options.

Engineering advantages

Design decisions that improve uptime, stability, and ownership cost

Magnetic Field Control & Plasma StabilityNo profiled magnet arrays with intense magnetic fields that extend well into the chamber and behind the target. These designs cause arcing and sputtering of the source and adjacent hardware unless very precise dark space gaps are maintained at specific pressures. Pressure changes cause the problem to re-occur. The well-confined primary magnetic fields of SunSource GEN II™ do not interfere with or influence adjacent sputtering, ion or plasma sources. This can result in arcing, huge differences in target erosion rates/depth along the length and premature target burn-through.

Target Exchange & ProductivityThe KamLok™ Fast Target Exchange System completely eliminates downtime and service costs associated with fasteners that have galled & seized after exposure to high temperature, vacuum & redeposited material. Targets of any length can be very quickly installed & replaced - in minutes rather than hours.

System Reliability & Cost of OwnershipThe robust, rugged design of SunSource GEN II™ sources makes the cost of ownership much lower. All external insulators have been eliminated & the implementation of the Utility Module makes leaky brazed or soldered water lines a thing of the past. Locking push-to connect water and electrical fittings ensure absolutely reliable, easy to service utility connections.

Cooling & Thermal PerformanceThe exit water flow through the cathode body is the same as the inlet flow. There are no internal water flow restrictions or backpressure. The result is higher achievable power levels, uniform target cooling mitigating against hot spots & whisker growth & effective cooling of the magnet array for a longer lifetime.

Maintenance & ServiceabilityAnode/Ground Shields are easily removed for service & cleaning. They are thick wall stainless steel to withstand repeated exposure to vapor honing, grit blasting & chemical cleaning. We never machine the source & mounting flange from a single piece of aluminum. We never weld the anode/ground shields together - they crack due to thermal expansion during use and in both cases, the entire source has to be removed and disassembled for routine maintenance.

Gas Distribution & Materials DesignMultiple internal gas distribution circuits can be incorporated into a single source - making balancing of pressure & gas flow in large (or just poorly designed & pumped) systems vastly easier. Use of high quality, structurally strong, high dielectric value Ultem insulator material instead of cheap Delrin that turns to carbon when an arc occurs & Teflon that cold flows and leaks over time. The target clamps and cathode body are not sputtered. Films are not contaminated and the target clamps are not a consumable item. Zinc plated magnets exposed to vacuum used in competing designs are not used.

Practical innovations

Features that save money and increase productivity

Explore the Difference for Yourself!



  • Kamlok™ Fast Target Exchange System eliminates the use of fasteners to retain targets to sputtering source. It prevents damage to cathode body caused by galled and seized fasteners.

  • Fewer parts to service and replace.

  • Durable, high reliability water, power, vacuum and gas connections. Components damaged during use or maintenance can be easily replaced by the user - No machining, welding or brazing required.

  • Target exchange is quick and easy - Simply remove anode/ground shields, turn small number of Kamscrews, remove target clamps, replace target and reassemble.

  • External screw insulators have been eliminated.

  • Reliable push-to-connect locking water and power fittings.

Typical internal mount configuration diagram


Flange Mount Configuration
Flange mount configuration
Flange mount  Diagram
Component details

Target backing, KamLok™ mechanism, utility module, and eroded-target examples

Target backing plates

Standard and stepped target backing plate options for thin targets.

KamLok mechanism closeup

Target clamping bar, KamLok mechanism, and gas distribution hole detail.

Exploded source assembly

Exploded source view showing serviceable assembly architecture.

KamLok assembled source

KamLok™ assembly with high-temperature anti-galling coating.

Utility module

Utility module with push-to-connect water, power, and argon gas connections.

Eroded targets

Eroded targets

Installation options

Available in a wide variety of installation configurations (Not Limited to the Examples Shown)

Long internal source with ISO flanges

Long Internal Source

ISO flange configuration for extended internal mounting applications.

Cantilever source

Cantilever Source

Compact cantilevered source arrangement for specialized mechanical integration.

Custom flange mount

Custom Flange Mount

Low-profile flange configuration for tailored chamber integration.

Low profile internal mount with atmospheric utility housing

Low Profile Internal Mount

Internal mount with atmospheric utility housing for compact system layouts.

Retrofit Sources for Legacy Sputtering Systems

Internal mount with atmospheric utility housing for compact system layouts.

Standard Flange Mount SunSource™ with Anode Shields & Kamlok™ Mechanism

Internal mount with atmospheric utility housing for compact system layouts.