Magnetron Sputtering Sources & PVD Components | Materials Science PVD

Materials Science PVD designs high-performance magnetron sputtering sources, sputtering power supplies, target exchange systems, and PVD accessories for thin-film deposition systems.

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  • SunSource™ Linear Sources

    Well-Proven, Industry Standard Materials Science, Inc. SunSource GEN II™ Magnetron Sputtering Sources in a variety of rectangular configurations. 

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  • SunSource™ Round Sources

    The industry standard for reactively sputtered and ion-assisted optical coating.  The SunSource Modeler™ Monte Carlo Thin Film Distribution Modeling Program for Round Sputtering Sources is also available Here

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  • Polaris™ 2" & 3" Research Sources

    Low cost, highly flexible sources intended for the researcher with a multiplicity of applications to address.  Multiple feedthrough, mounting flange, tilt angle and positioning possibilities.  Argon and reactive gas through the cathode body, making it ideal for reactive and low pressure operation.

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  • SunSource™ Performance Characteristics

    SunSource GEN II™ sputtering sources are engineered to deliver high target utilization, stable plasma behavior, and consistent thin-film performance across a wide range of operating conditions.

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  • SunSource™ 90 mm Linear Magnetron Sputtering Sources

    SunSource GEN II™ sputtering sources are designed for high target utilization and controlled plasma behavior in narrow-width coating applications. Discover the 90 mm lineup.

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  • Ion™ DC Magnetron Sputtering Power Supplies with Advanced Arc Suppression

    The Ion™ Series DC Magnetron Power Supply supports sputtering and substrate bias applications with stable operation across a 0–1000 V range and down to 20 watts for non-reactive processes.

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  • Kamlok™ Fast Target Exchange System

    One of a series of practical innovations that save money and increase productivity, the Kamlok™ Fast Target Exchange System is designed to reduce downtime, simplify service, and eliminate the fastener-related issues common in conventional target clamp designs.

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  • RF Power Supplies and Sputtering Packages

    The Polaris™ 300/600 packages are designed to deliver maximum RF sputtering performance, flexibility, and value. Users can select their preferred sputtering source configuration, choose between automatic or manual impedance matching, and add available options such as RS-232 communication or a common exciter for systems operating two or more RF-powered sources simultaneously.

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  • More Power Supplies and Accessories

    From legacy options to power supply bundles, everything you need to keep your systems operating efficiently.

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  • Upgrades and Retrofit Sputtering Sources

    We provide replacement and upgrade solutions designed to improve performance, reliability, serviceability, and long-term operating costs.

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  • Other Useful Components

    Field-proven components built for demanding sputtering and vacuum environments, helping reduce service issues, improve reliability, and eliminate the need to engineer custom solutions from scratch.

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