Superior arc detection and suppression: <100 nsec response time, <1 mJ arc energy
Ion™ Series DC Magnetron Power Supply
The Ion™ Series DC Magnetron Power Supply supports sputtering and substrate bias applications with stable operation across a 0–1000 V range and down to 20 watts for non-reactive processes. It operates across a wide impedance range without transformer tap changes and delivers consistent performance under varying load conditions. The compact, low-profile chassis is rack-efficient and compliant with CE and ETL/NRTL standards, with a 2-year warranty.

Fast arc suppression, precise control, and broad operating flexibility
Available in 500 W, 1000 W, and 1500 W output power versions
Adjustable arc detection delay and off-time before restart
Voltage, current, and power regulation modes with precise resolution and run-to-run repeatability
Adjustable power ramping and run timer
Stored target parameters for up to 7 targets with kWHr counting and time limits
Wide 0–1000 V operating range with full rated power under most conditions; suitable for substrate bias up to 1000 V
Large impedance range with no transformer tap changes; RS-232 and analog communication capability
Integrated sputtering packages
Polaris GEN II 2" & 3" Research Sputtering Sources
used in combination with the Ion™ 1500 allow performance
not possible with any other sputtering source & DC power
supply - for example:
- Sputter 1/4" [6,35 mm] thick Ni targets
- Deposit insulating films from metallic targets without the use of expensive power supplies in an essentially arc-damage free environment
- Achieve superior target utilization
- Apply virtually full rated output of power supply to source across broad pressure range
- Deposit very thin films at extremely low power levels
WDC Pass/RF Blocking Filter Installed on Output of Ion™ 1500
Blocking filters (required when the Ion™ DC Magnetron Power Supply
is used simultaneously with an RF Power Supply) and
switches that allow the sequential use of multiple sputtering
sources from a single power supply are available.
Two Power Supply Input, 4 Output (2 Outputs per Input) DC/RF Switch
Power supply switches allow 1 each Ion™ DC Magnetron Power Supply
to be switched between 2,3, or 4 sputtering sources or for 2 each power
supplies (either 1 or 2 Ion™ DC Magnetron Power Supplies or RF power
generation system - can be one of each type) to be switched. One input to
two outputs for each power supply. Can be controlled from the users
system controller or from a separate, stand-alone controller.
Electrical, control, and mechanical performance
Arc damage is virtually eliminated when suppression is activated
Watch the Video of Ion™ 1500 and Polaris Source in Operation - still images from this video shown below
No Arc Suppression
Hard arc on Al target in O2 environment on 3 inch Polaris™ source.
Arcing is still decaying
Same view & conditions as no arc suppression, but with plasma re-igniting.
Stable Suppressed Plasma
Arc suppression of Ion™ 1500 working in same environment & conditions - producing a stable plasma & good target utilization with negligible arc induced damage.