Precision sputtering technology

Ion Magnetron Supply Ion™ Series DC Magnetron Power Supply

The Ion™ Series DC Magnetron Power Supply supports sputtering and substrate bias applications with stable operation across a 0–1000 V range and down to 20 watts for non-reactive processes. It operates across a wide impedance range without transformer tap changes and delivers consistent performance under varying load conditions. The compact, low-profile chassis is rack-efficient and compliant with CE and ETL/NRTL standards, with a 2-year warranty.

Core benefits

Fast arc suppression, precise control, and broad operating flexibility


Superior arc detection and suppression: <100 nsec response time, <1 mJ arc energy


Available in 500 W, 1000 W, and 1500 W output power versions


Adjustable arc detection delay and off-time before restart


Voltage, current, and power regulation modes with precise resolution and run-to-run repeatability


Adjustable power ramping and run timer


Stored target parameters for up to 7 targets with kWHr counting and time limits


Wide 0–1000 V operating range with full rated power under most conditions; suitable for substrate bias up to 1000 V


Large impedance range with no transformer tap changes; RS-232 and analog communication capability

System advantages

Integrated sputtering packages

Complete sputtering package


Polaris GEN II 2" & 3" Research Sputtering Sources used in combination with the Ion™ 1500 allow performance not possible with any other sputtering source & DC power supply - for example:

  • Sputter 1/4" [6,35 mm] thick Ni targets
  • Deposit insulating films from metallic targets without the use of expensive power supplies in an essentially arc-damage free environment
  • Achieve superior target utilization
  • Apply virtually full rated output of power supply to source across broad pressure range
  • Deposit very thin films at extremely low power levels
Accessories
Polaris GEN II 2 & 3

WDC Pass/RF Blocking Filter Installed on Output of Ion™ 1500
Blocking filters (required when the Ion™ DC Magnetron Power Supply is used simultaneously with an RF Power Supply) and switches that allow the sequential use of multiple sputtering sources from a single power supply are available.

Stable plasma with Ion 1500 arc suppression

Two Power Supply Input, 4 Output (2 Outputs per Input) DC/RF Switch
Power supply switches allow 1 each Ion™ DC Magnetron Power Supply to be switched between 2,3, or 4 sputtering sources or for 2 each power supplies (either 1 or 2 Ion™ DC Magnetron Power Supplies or RF power generation system - can be one of each type) to be switched. One input to two outputs for each power supply. Can be controlled from the users system controller or from a separate, stand-alone controller.

Specifications

Electrical, control, and mechanical performance

Ion™ DC Magnetron Power Supplies
Ion DC Power Supply
Input Frequency
50 - 60 Hz
Input Phase
1 phase
Input Voltage
100 - 250 VAC (lower VAC may limit output)
Input Current
13.7 amps maximum
Power Factor
> 0.98
Input Power Consumption
1.75 kW
Output Power
1500 watts; 1000 watts; 500 watts
Output Power @ 1000 volts
1500 watts; 1000 watts; 500 watts
Output Power @ 500 volts
1500 watts; 1000 watts; 500 watts
Output Power @ 200 volts
800 watts; 600 watts; 400 watts
Output Power Resolution Compared to Setpoint - 500 to 1500 watts
±1 watt
Output Power Resolution Compared to Setpoint - 500 watts or less
± 0.5 watt
Output Voltage (steady state)
1000 volts maximum
Output Voltage (strike)
1000 volts maximum
Output Current (maximum)
4 A (1500 watts); 3 A (1000 watts); 2 A (500 watts)
Arc Detection Time
< 100 nsecs (.1 µ secs)
Arc Energy
< 1 mJ
Arc Detect Delay Time
0.1 to 6500 µ secs (adjustable)
Arc Out/Off Time
0 (no arc handling) or 32 to 65000 µ secs (adjustable)
Arc Rate Counter
Yes
Arc Recovery Time
Set points will be re-established < 200 µ secs after arc off time
Line Regulation
> 99% (includes load and line variations over an arbitrary time interval) - aka < 1%
Load Regulation
> 99% (includes load and line variations over an arbitrary time interval) - aka < 1%
Power Ramping
0.001 to 65 seconds (adjustable)
Run Timer
0.1 to 6553 seconds (adjustable)
kWHr Counting
Yes
kWHr Limit
0 (limit shutdown disabled) or 0.01 to 655 kWHr's
LED Display Accuracy
1%
Display Resolution
0.1 watt, 1 volt, 0.001 amp (1 milliamp)
Stored Target Information
Stores parameter sets for targets that can be re-installed after exchange. Saves P/V/I, ramp time, run time, arc detect delay, arc off time, kWhr's for 7 separate targets
Interlocks
1 each
Temperature Monitoring/Protection
Yes. “Fan on Demand” cooling with thermal shutdown protection.
Dimensions
48.3 cm/19" x 47.6 cm/18.75" x 4.44 cm/1.75" (1 U Rack Height)
Weight
8.2 kG/18 pounds
RS-232/Analog Interfaces
Yes
DC Bias Operation
Basic open circuit operation between 1000 volts to < 100 volts
Output Power Connector
Female HN
Arc suppression

Arc damage is virtually eliminated when suppression is activated

Watch the Video of Ion™ 1500 and Polaris Source in Operation - still images from this video shown below

Hard arc with no arc suppression

No Arc Suppression

Hard arc on Al target in O2 environment on 3 inch Polaris™ source.

Plasma re-igniting while arcing decays

Arcing is still decaying

Same view & conditions as no arc suppression, but with plasma re-igniting.

Stable plasma with Ion 1500 arc suppression

Stable Suppressed Plasma

Arc suppression of Ion™ 1500 working in same environment & conditions - producing a stable plasma & good target utilization with negligible arc induced damage.

Dimensions

Drawing 00002103, Rev. B Ion™ 1500 DC Magnetron Sputtering Power Supply

View Datasheet

Ion Series power supply dimensional diagram