This application note outlines grounding best practices for high-power DC sputtering systems to ensure stable plasma control, reliable power delivery, and effective arc management. It also describes recommended grounding methods and cable configurations for minimizing electrical noise and maintaining safe system operation.

This application note provides guidelines for determining sputtering source length based on substrate width and desired coating uniformity. It explains how source geometry, operating conditions, and source-to-substrate spacing influence thickness distribution performance in SunSource™ cathodes.

This application note outlines cooling water quality requirements and best practices for maintaining SunSource™ sputtering sources. It covers the causes and prevention of galvanic corrosion, scaling, biological growth, and other water-related issues that can reduce performance and increase maintenance costs.