40 wt% target utilization with 10 mm (0.40") thick targets
Precision sputtering technology
GEN II 90 mm Wide Linear Magnetron Sputtering Sources
SunSource GEN II™ sputtering sources are designed for high target utilization and controlled plasma behavior in narrow-width coating applications. The balanced magnetic design confines plasma discharge above the target surface, reducing stray fields that cause arcing, substrate heating, and unwanted source sputtering. The platform maintains stable operation across a broad pressure range and supports efficient sputtering at both low and standard power levels, particularly in compact vacuum web coating systems.
Core benefits
Engineered for cleaner plasma behavior and better use of every target
Narrow-width source design for high utilization in compact systems
Balanced magnetic design confines plasma above target surface
Minimal stray electromagnetic fields reduce arcing, substrate damage, and heating
Virtually no center redeposition
Stable operation across a broad pressure range and at low power levels
Suitable for small vacuum web coaters with geometry matched to chilled drum circumference
Cost-effective alternative to small rotatable cylindrical magnetrons; includes external flange and cantilevered internal mount options with integrated utilities
Application fit
Custom Flange Mounted 90mm Source
SunSource GEN II™ sources
consist of a basic sputtering
module that can be integrated
into a variety of source mounting
schemes. External flange mount,
internal mount and retrofit
configurations are available with
a variety of feedthrough and
utility connection possibilities.
Internal Mount 90mm Source
With top and side anode shields installed.
Performance view
Stable operation across a broad pressure range
2 mTorr
10 mTorr
20 mTorr
